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Optical Engineering

Synthetic holograms written by a laser pattern generator
Author(s): Ulrich W. Krackhardt; Johannes Schwider; M. Schrader; Norbert Streibl
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Paper Abstract

A new pattern generator, initially designed for ASIC fabrication, is employed for writing synthetic holograms and other micro-optical components. The specifications and limits of this machine are investigated. Test structures and synthetic holograms are shown. Arbitrary patterns with micrometer resolution, submicrometer positioning accuracy, large area patterns (up to 150 x 150 mm2 possible), and good quality microprofiles are demonstrated.

Paper Details

Date Published: 1 April 1993
PDF: 5 pages
Opt. Eng. 32(4) doi: 10.1117/12.61207
Published in: Optical Engineering Volume 32, Issue 4
Show Author Affiliations
Ulrich W. Krackhardt, Univ. Erlangen-Nuernberg (Germany)
Johannes Schwider, Univ. Erlangen-Nuernberg (Germany)
M. Schrader, Univ. Erlangen-Nuernberg (Germany)
Norbert Streibl, Univ. Erlangen-Nuernberg (Germany)


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