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Optical Engineering

Design and development of a rotating wafer scanner
Author(s): Stavros Kalafatis; John F. O'Hanlon; Kenneth P. Gross
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Paper Abstract

A rotating wafer scanner is designed and developed to determine its operational feasibility and advantages over a linear wafer scanner. The scanner is designed to operate at atmosphere. Each of its constituent parts were independently tested, and when the assembled system was evaluated, 0.2-μm-diam particle detectivity was observed.

Paper Details

Date Published: 1 February 1993
PDF: 5 pages
Opt. Eng. 32(2) doi: 10.1117/12.60850
Published in: Optical Engineering Volume 32, Issue 2
Show Author Affiliations
Stavros Kalafatis, Intel Corp. (United States)
John F. O'Hanlon, Univ. of Arizona (United States)
Kenneth P. Gross, Tencor Instruments (United States)


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