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Optical Engineering

Diffraction properties of a 0.24-μm period multilayer laminar amplitude grating in the soft x-ray region
Author(s): H. Berrouane; Chantal G. Khan Malek; Jean-Michel Andre; F. R. Ladan; Jean-Rene Rivoira; Robert J. Barchewitz
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Paper Abstract

We report on the fabrication of a laminar multilayer amplitude grating, characterization in the soft x-ray region, and modeling of its properties. Holographic lithography was used to produce a 0.24-μm spatial period grating on a triode sputtered Mo/C multilayer mirror. The pattern was transferred into the multilayer mirror by reactive ion etching in an SF6 plasma after an intermediate lift-off step. The position and relative efficiency of the different orders of a grating etched down to the silicon substrate were measured at the Cu Lαβ line (1.33 nm). The results were interpreted in the framework of a scalar kinematic diffraction theory.

Paper Details

Date Published: 1 February 1992
PDF: 6 pages
Opt. Eng. 31(2) doi: 10.1117/12.56082
Published in: Optical Engineering Volume 31, Issue 2
Show Author Affiliations
H. Berrouane, Univ. de Paris VI (France)
Chantal G. Khan Malek, CNET-CNRS (France)
Jean-Michel Andre, Univ. de Paris VI (France)
F. R. Ladan, Ctr. National de la Recherche Scientifique (France)
Jean-Rene Rivoira, Univ. d'Aix-Marseille III (France)
Robert J. Barchewitz, Univ. de Paris VI (France)


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