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Optical Engineering

Soft X-ray multilayers fabricated by electron-beam deposition
Author(s): Masaaki Sudoh; Ryouhei Yokoyama; Mitsuo Sumiya; Masaki Yamamoto; Mihiro Yanagihara; Takeshi Namioka
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Paper Abstract

We have investigated the optimum deposition conditions for fabricating Mo/Si multilayers on Si wafers by means of electron-beam deposition, taking the substrate temperature and deposition rate as parameters. Mo/Si multilayers made at substrate temperatures Of room ternperature to 420°C and at deposition rates of 0.02 to 1.0 nm/s were evaluated by transmission electron micrographs of their cross sections, x-ray diffraction patterns, and their spectral reflectances for soft x rays of 10 to 17 nm. The optimum deposition parameters were found to be 100 to 150°C and 0.02 to 0.2 nm/s, respectively, for substrate temperature and deposition rate. The Mo/Si multilayer made under the optimum condition showed fairly smooth layered structure and a reflectance of ~30% for unpolarized soft x ray of 14.6 nm at an incident angle of 20 deg.

Paper Details

Date Published: 1 August 1991
PDF: 6 pages
Opt. Eng. 30(8) doi: 10.1117/12.55908
Published in: Optical Engineering Volume 30, Issue 8
Show Author Affiliations
Masaaki Sudoh, Toshiba Corp. (Japan)
Ryouhei Yokoyama, Toshiba Corp. (Japan)
Mitsuo Sumiya, Toshiba Corp. (Japan)
Masaki Yamamoto, Tohoku Univ. (Japan)
Mihiro Yanagihara, Tohoku Univ. (Japan)
Takeshi Namioka, Universities' Space Research Association (United States)

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