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Optical Engineering

Four-mirror optical system for UV submicrometer lithography
Author(s): Sang-Soo Lee; Sung Chan Park
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Paper Abstract

A design of a four-mirror optical system for submicron lithography using a KrF excimer laser beam (λ = 248 nm) is presented. By thirdorder aberration theory, analytic solutions for a telecentric, flat-field, anastigmatic four-spherical-mirror system (reduction magnification 5 x ) are found. Aspherization is carried out to the spherical mirror surfaces in order to reduce the residual higher order aberrations and vignetting effect. We obtain a reflection system useful in submicron lithographic application.

Paper Details

Date Published: 1 July 1991
PDF: 5 pages
Opt. Eng. 30(7) doi: 10.1117/12.55879
Published in: Optical Engineering Volume 30, Issue 7
Show Author Affiliations
Sang-Soo Lee, Korea Advanced Institute of Science & Technology (South Korea)
Sung Chan Park, Korea Advanced Institute of Science and Technology (South Korea)

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