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Optical Engineering

Comparison of ultrathin W-Si and W-C multilayers for x-ray optics
Author(s): Bernard Vidal; J. Marfaing
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Paper Abstract

New magnetic materials and x-ray mirrors have lead to the preparation of multilayered structures (MLS) with ultrathin periodic layers. However, physical limitations appear for periods below some tens of A. In particular, fabrication tolerances relative to these ultrathin layer thicknesses are critical for the realization of effective MLS. In sputtering, the deposition rate is easily reproducible and can be maintained at a constant and low value for several hours; for this reason we are able to perform a large number (more than 100) of periodic ultrathin layers by this system (3 to 1.5 nm period). High Resolution Transmission Electron Microscopy (HRTEM) and x-ray reflectivity measurements are used to compare interfaces and stacking regularities for different samples with 140 layers. The W/Si MLS present a better quality of interfaces and structures compared to the W/C MLS.

Paper Details

Date Published: 1 May 1991
PDF: 5 pages
Opt. Eng. 30(5) doi: 10.1117/12.55834
Published in: Optical Engineering Volume 30, Issue 5
Show Author Affiliations
Bernard Vidal, Univ. d'Aix-Marseille III (France)
J. Marfaing, Univ. d'Aix-Marseille III (France)


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