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Optical Engineering

Karhunen-Loève transform in optical microscopy: application to linewidth measurement
Author(s): Francois Vernotte; Daniel Charraut; Eric Lantz; Daniel A. Courjon
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Paper Abstract

The linewidth measurement on wafers depends on the small local irregularities in the region being tested. Such defects must be first of all detected and then canceled in order to give an estimation of the average linewidth. Image processing based on the Karhunen-Loève transform of multiple acquisitions in different experimental conditions is proposed. Using statistical information compression, irregularities are easily detected and efficient noise filtering is performed.

Paper Details

Date Published: 1 September 1990
PDF: 6 pages
Opt. Eng. 29(9) doi: 10.1117/12.55685
Published in: Optical Engineering Volume 29, Issue 9
Show Author Affiliations
Francois Vernotte, Observatoire De Besancon (France)
Daniel Charraut, Univ. de Franche-Compte/URA 214 CNRS (France)
Eric Lantz, Univ. de Franche-Compte/URA 214 CNRS (France)
Daniel A. Courjon, Univ. de Franche-Compte/Besancon (France)

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