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Optical Engineering

High density moire interferometry
Author(s): F. X. Wang; Albert S. Kobayashi
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Paper Abstract

A theoretical background for producing a diffraction grating with line density of 3200 lines/mm for moire interferometry is presented. The utility of this analysis is then demonstrated by producing a 3200 lines/mm grating on a three-point bend beam with an argon ion laser. The possibility of using this procedure with an invisible light source to generate a moire diffraction grating of higher line density is noted.

Paper Details

Date Published: 1 January 1990
PDF: 4 pages
Opt. Eng. 29(1) doi: 10.1117/12.55566
Published in: Optical Engineering Volume 29, Issue 1
Show Author Affiliations
F. X. Wang, Nanchang Institute of Aeronautical Technology (China)
Albert S. Kobayashi, Univ. of Washington (United States)


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