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Optical Engineering

Holographic microlithography
Author(s): Francis S. M. Clube; Simon Gray; Denis Struchen; Jean-Claude Tisserand; Stephane Malfoy; Yves Darbellay
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Paper Abstract

Holographic mask aligners represent the latest addition to commercially available lithographic technologies. Their combination of very high resolution (< 0.5 μm) and very large exposure field brings a new capability to the microelectronics industry, especially for the manufacture of flat panel displays. The machine is fully automated and includes a scanning laser illumination system, a dynamic focus system permitting patterns to be printed over poor-flatness substrates, and an alignment system providing 0.3-μm overlay accuracy. A higher-accuracy alignment system under development demonstrates 50-nm measurement accuracy. A step-and-repeat hologram recording method enables tighter control of feature linewidth.

Paper Details

Date Published: 1 September 1995
PDF: 7 pages
Opt. Eng. 34(9) doi: 10.1117/12.205673
Published in: Optical Engineering Volume 34, Issue 9
Show Author Affiliations
Francis S. M. Clube, Holtronic Technologies (Switzerland)
Simon Gray, Holtronic Technologies (Switzerland)
Denis Struchen, Holtronic Technologies (Switzerland)
Jean-Claude Tisserand, Holtronic Technologies (Switzerland)
Stephane Malfoy, Holtronic Technologies (Switzerland)
Yves Darbellay, Holtronic Technologies (Switzerland)

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