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Optical Engineering

High-carrier-frequency fan-out gratings fabricated by total internal reflection holographic lithography
Author(s): Peter Ehbets; Hans Peter Herzig; Markku Kuittinen; Francis S. M. Clube; Yves Darbellay
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Paper Abstract

Total internal reflection (TIR) holographic lithography is applied to the fabrication of binary diffractive optical elements with submicrometer surface relief features. The recording conditions for the intermediate TIR volume hologram, used for high-resolution proximity printing, are discussed. In particular, the fabrication of efficient high-carrier-frequency fan-out gratings is considered and experimental results are presented for an off-axis 9 x 1 fan-out element in photoresist with a carrier frequency of 1000 lines/mm.

Paper Details

Date Published: 1 August 1995
PDF: 7 pages
Opt. Eng. 34(8) doi: 10.1117/12.205661
Published in: Optical Engineering Volume 34, Issue 8
Show Author Affiliations
Peter Ehbets, Univ. of Neuchatel (Switzerland)
Hans Peter Herzig, Univ. of Neuchatel (Switzerland)
Markku Kuittinen, Univ. of Joensuu (Finland)
Francis S. M. Clube, Holtronic Technologies (Switzerland)
Yves Darbellay, Holtronic Technologies (Switzerland)

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