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Optical Engineering

Using conventional photolithographic glass masks as high-efficiency phase gratings
Author(s): Guy Voirin; Olivier M. Parriaux; Henry Vuilliomenet; R. Wildi; Ulrich Benner; S. M.O.L. Schneider
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Paper Abstract

By patterning the iron oxide film of a conventional iron oxide mask it is possible to obtain a binary phase grating of high diffraction efficiency and high transmission that can be used in high-resolution displacement sensors.

Paper Details

Date Published: 1 September 1995
PDF: 4 pages
Opt. Eng. 34(9) doi: 10.1117/12.201811
Published in: Optical Engineering Volume 34, Issue 9
Show Author Affiliations
Guy Voirin, Swiss Ctr. for Electronics and Microtechnology (Switzerland)
Olivier M. Parriaux, Ctr. Suisse d'Electronique et de Microtechnique SA (Switzerland)
Henry Vuilliomenet, Ctr. Suisse d'Electronique et de Microtechnique SA (Switzerland)
R. Wildi, IMT (Switzerland)
Ulrich Benner, Baumer Electric (Switzerland)
S. M.O.L. Schneider, Baumer Electric (Switzerland)


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