Share Email Print
cover

Optical Engineering

Spatial-frequency bandwidth in the photolithographic transfer of submicron gratings
Author(s): Olivier M. Parriaux; Henry Vuilliomenet; Pierre Sixt; Nathalie Cuny
Format Member Price Non-Member Price
PDF $20.00 $25.00

Paper Abstract

The principle of the photolithographic mask transfer of high-spatial-frequency gratings under the Littrow angle is shown to be so tolerant that a broad spatial-frequency spectrum can be transferred under the same exposure conditions.

Paper Details

Date Published: 1 September 1995
PDF: 3 pages
Opt. Eng. 34(9) doi: 10.1117/12.200610
Published in: Optical Engineering Volume 34, Issue 9
Show Author Affiliations
Olivier M. Parriaux, Ctr. Suisse d'Electronique et de Microtechnique SA (Switzerland)
Henry Vuilliomenet, Ctr. Suisse d'Electronique et de Microtechnique SA (Switzerland)
Pierre Sixt, Ctr. Suisse d'Electronique et de Microtechnique (Switzerland)
Nathalie Cuny, Ctr. Suisse d'Electronique et de Microtechnique S.A. (Switzerland)


© SPIE. Terms of Use
Back to Top