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Optical Engineering

Antireflection-coated diffractive optical elements fabricated by thin-film deposition
Author(s): Edgar Pawlowski; Berndt Kuhlow
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Paper Abstract

The use of thin-film deposition in the fabrication of antireflection-coated diffractive optical elements is discussed. The antireflection coatings for these diffractive elements are optimized on the basis of an angular spectrum approach and the method of characteristic matrices. A minimum reflectivity as low as 1 x 10-4 is realized using in situ controlled multilayers of TiO2 and SiO2. The blazed profile of the diftractive optical elements is approximated by a stepped profile with up to 32 phase levels. The highest measured diffraction efficiency for 32-level Fresnel zone lenses was 97%.

Paper Details

Date Published: 1 November 1994
PDF: 10 pages
Opt. Eng. 33(11) doi: 10.1117/12.179893
Published in: Optical Engineering Volume 33, Issue 11
Show Author Affiliations
Edgar Pawlowski, Heinrich-Hertz-Institut (Germany)
Berndt Kuhlow, Heinrich-Hertz-Institut (Germany)

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