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Optical Engineering

Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresists
Author(s): Michael T. Gale; Markus Rossi; Joern Pedersen; Helmut Schuetz
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Paper Abstract

A laser writing system for the fabrication of continuous-relief micro-optical elements in photoresist is described. The technology enables a wide range of planar micro-optical elements to be fabricated and replicated into polymer film using Ni shims electroformed from the photo-resist originals. The advantages and limitations of laser writing technology for micro-optics fabrication are discussed. Examples of fabricated micro-optical elements include Fresnel microlenses and microlens arrays, kinoforms, and other continuous-relief phase elements.

Paper Details

Date Published: 1 November 1994
PDF: 11 pages
Opt. Eng. 33(11) doi: 10.1117/12.179892
Published in: Optical Engineering Volume 33, Issue 11
Show Author Affiliations
Michael T. Gale, Paul Scherrer Institute (Switzerland)
Markus Rossi, Paul Scherrer Institute (Switzerland)
Joern Pedersen, Paul Scherrer Institute (Switzerland)
Helmut Schuetz, Paul Scherrer Institute (Switzerland)


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