Share Email Print
cover

Optical Engineering

Symmetry measure and phase-matched filters in pattern recognition
Author(s): Stephan Teiwes; Frank Wyrowski
Format Member Price Non-Member Price
PDF $20.00 $25.00

Paper Abstract

The use of the diffraction phenomenon in pattern recognition is a well-established area in optical information processing. Typically the generation of a correlation peak by suitable filters is used to recognize a pattern. We introduce a symmetry measure for pattern recognition. It can be used for a wide class of filters, which we call phase-matched filters. Encoding techniques of diffractive optics allow its implementation as amplitude- or phase-encoded filters.

Paper Details

Date Published: 1 November 1994
PDF: 8 pages
Opt. Eng. 33(11) doi: 10.1117/12.179884
Published in: Optical Engineering Volume 33, Issue 11
Show Author Affiliations
Stephan Teiwes, Univ. of Karlsruhe (Switzerland)
Frank Wyrowski, Berlin Institute of Optics (Germany)


© SPIE. Terms of Use
Back to Top