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Optical Engineering

Electron-beam-deposited Mo/Si and MoxSiy/Si multilayer x-ray mirrors and gratings
Author(s): Bernt Schmiedeskamp; Andreas Kloidt; Hans-Juergen Stock; Ulf Kleineberg; Thorsten Doehring; Michael Proepper; Steffen Rahn; Kerstin Hilgers; Bernhard Heidemann; Thorsten Tappe; Ulrich Heinzmann; Michael K. Krumrey; Peter Mueller; Frank Scholze; Klaus F. Heidemann
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Paper Abstract

For the wavelength region above the Si-L edge normal incidence, soft x-ray mirrors are produced with peak reflectivities close to 60%. The multilayer systems consist of molybdenum and silicon and are fabricated by electron beam evaporation in ultrahigh vacuum. A smoothing of the boundaries, and thereby a drastic enhancement of the reflectivity, is obtained by thermal treatment of the multilayer systems during growth. The thermal stability of the multilayer stacks could be improved considerably up to 850° C by mixing Mo and Si in the absorber layers and producing thus MoxSiy/Si multilayers with x and y denoting the amounts of Mo and Si in the absorber layer, respectively. First attempts are reported to produce mirrors with a bilayer thickness of 2.6 nm. An improvement in the quality of these interfaces can be obtained by bombardment with Ar+ ions. We report on normal incidence reflectivity measurements of the mirrors with synchrotron radiation and finally on the normal incidence diffraction efficiencies of a Mo/Si multilayer coated grating, for which values of 5.5% are achieved for the + 1'st and - 1'st diffraction orders.

Paper Details

Date Published: 1 April 1994
PDF: 8 pages
Opt. Eng. 33(4) doi: 10.1117/12.163207
Published in: Optical Engineering Volume 33, Issue 4
Show Author Affiliations
Bernt Schmiedeskamp, Univ. Bielefeld (Germany)
Andreas Kloidt, Univ. Bielefeld (Germany)
Hans-Juergen Stock, Univ. Bielefeld (Germany)
Ulf Kleineberg, Univ. Bielefeld (Germany)
Thorsten Doehring, GSF - EPOKA (Germany)
Michael Proepper, Univ. Bielefeld (Germany)
Steffen Rahn, Univ. Bielefeld (Germany)
Kerstin Hilgers, Univ. Bielefeld (Germany)
Bernhard Heidemann, Univ. Bielefeld (Germany)
Thorsten Tappe, Univ. Bielefeld (Germany)
Ulrich Heinzmann, Univ. Bielefeld (Germany)
Michael K. Krumrey, Physikalisch-Technische Bundesanstalt Berlin (Germany)
Peter Mueller, Physikalisch-Technische Bundesanstalt Berlin (Germany)
Frank Scholze, Physikalisch-Technische Bundesanstalt Berlin (Germany)
Klaus F. Heidemann, Fa. Carl Zeiss (Germany)

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