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Optical Engineering

Aberration measurement using axial intensity
Author(s): Qian Gong; Smiley S. Hsu
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Paper Abstract

A method of measuring optical aberrations using axial intensity information near paraxial focus is described. This method can be applied to systems with or without central obscurations. The axial intensity profile can also be used to determine the location of paraxial focus in a centrally obscured system, a measurement that is difficult to achieve using other methods. The experimental data demonstrate good agreement with theoretical predictions.

Paper Details

Date Published: 1 April 1994
PDF: 11 pages
Opt. Eng. 33(4) doi: 10.1117/12.163190
Published in: Optical Engineering Volume 33, Issue 4
Show Author Affiliations
Qian Gong, Swales & Associates Inc. (United States)
Smiley S. Hsu, Swales and Associates, Inc. (United States)

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