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Optical Engineering

Process techniques for improving performance of positive tone silylation
Author(s): Edward K. Pavelchek; Gary S. Calabrese; John F. Bohland; Bruce W. Dudley; Susan K. Jones; Peter W. Freeman
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Paper Abstract

Two approaches that control the overflow of silylated material that can occur subsequent to surface imaging of acid-hardened resists are introduced. Treatment of the resist surface with a cross-linking agent [bis(dimethylamino)dimethylsilane] prior to silylation can produce a surface layer with the physical integrity to constrain silylated material. Alternatively, the unexposed areas of the resist may be partially removed by development with a basic solution. The surface depressions thus produced allow volume expansion to occur during silylation without causing overflow.

Paper Details

Date Published: 1 October 1993
PDF: 6 pages
Opt. Eng. 32(10) doi: 10.1117/12.146858
Published in: Optical Engineering Volume 32, Issue 10
Show Author Affiliations
Edward K. Pavelchek, Shipley Co. Inc. (United States)
Gary S. Calabrese, Shipley Co. Inc. (United States)
John F. Bohland, Shipley Co. Inc. (United States)
Bruce W. Dudley, Microelectronics Ctr. of North Carolina (United States)
Susan K. Jones, Microelectronics Ctr. of North Carolina (United States)
Peter W. Freeman, Digital Equipment Corp. (United States)

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