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Optical Engineering

Holographic mask aligner
Author(s): Francis S. M. Clube; Simon Gray; Denis Struchen; Jean-Claude Tisserand
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Paper Abstract

Total internal reflection holography permits high-resolution, noncontact lithography over very large fields. A production lithographic system has been constructed employing specially developed illumination, focus, and alignment subsystems integrated onto a 6-in. substrate-handling mechanism. The system achieves an imaging resolution of 0.25 μm with a present overlay capability of ± 0.5 μm. A fine alignment system under development has demonstrated a 50-nm measurement accuracy. The technology is well suited to many applications, including the manufacture of flat panel displays, surlace acoustic wave devices, integrated optics, and optical storage disks.

Paper Details

Date Published: 1 October 1993
PDF: 7 pages
Opt. Eng. 32(10) doi: 10.1117/12.145967
Published in: Optical Engineering Volume 32, Issue 10
Show Author Affiliations
Francis S. M. Clube, Holtronic Technologies (Switzerland)
Simon Gray, Holtronic Technologies (Switzerland)
Denis Struchen, Holtronic Technologies (Switzerland)
Jean-Claude Tisserand, Holtronic Technologies (Switzerland)

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