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Optical Engineering

Rim phase-shift mask combined with off-axis illumination: a path to 0.5λ/numerical aperture geometries
Author(s): Timothy A. Brunner
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Paper Abstract

Phase-shift mask (PSM) approaches can be classified as either strong or weak. Weak PSM approaches, which are attractive because of their universal applicability to any pattern, are addressed. A simple design algorithm for rim PSM, called biased rim design (BiRD), is described. When used with normal stepper illumination (σ=0.5), the modest benefits of rim PSMs are of questionable value in many cases. However, theoretical considerations show a synergy of weak PSM cornbined with off-axis illumination. One specific combination, termed BiRD/QUEST, is explored through a series of simulations. These results suggest that a properly biased weak PSM with appropriate illumination will allow robust manufacturing of 0.5λ/NA lithographic patterns.

Paper Details

Date Published: 1 October 1993
PDF: 7 pages
Opt. Eng. 32(10) doi: 10.1117/12.145956
Published in: Optical Engineering Volume 32, Issue 10
Show Author Affiliations
Timothy A. Brunner, IBM Thomas J. Watson Research Ctr. (United States)

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