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Optical Engineering

Optical interconnection with phase-only masks by means of reactive ion etching
Author(s): JingJuan Zhang; Chao Xu; Shiping Gao
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Paper Abstract

The calculation results in a one-dimensional (1-D) interconnection system are proposed. The method of preparing phase-only masks with reactive ion etching is introduced. The masks are applied to a 1-D interconnection experiment. The experimental results are consistent with the theory.

Paper Details

Date Published: 1 August 1993
PDF: 5 pages
Opt. Eng. 32(8) doi: 10.1117/12.143723
Published in: Optical Engineering Volume 32, Issue 8
Show Author Affiliations
JingJuan Zhang, Graduate School Academia Sinica (China)
Chao Xu, Graduate School Academia Sinica (China)
Shiping Gao, Microelectronic Research Ctr. (China)

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