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Optical Engineering

Microlenses fabricated by melting a photoresist on a base layer
Author(s): Stefan Haselbeck; Horst Schreiber; Johannes Schwider; Norbert Streibl
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Paper Abstract

We report on the fabrication of novel refractive microlens arrays in photoresists, in particular on lenses with numerical apertures ranging from 0.1 to 0.3. A base layer technique is described that makes it possible to fabricate lower numerical aperture lenses in resist, compared with microlenses on glass substrates. The wave aberrations were measured in a Mach-Zehnder interferometer. Diffraction-limited performance was achieved for a numerical aperture of 0.2 and a lens diameter of 270 μm.

Paper Details

Date Published: 1 June 1993
PDF: 3 pages
Opt. Eng. 32(6) doi: 10.1117/12.135845
Published in: Optical Engineering Volume 32, Issue 6
Show Author Affiliations
Stefan Haselbeck, Univ. Erlangen-Nuremberg (Germany)
Horst Schreiber, Univ. Erlangen-Nuremberg (Germany)
Johannes Schwider, Univ. Erlangen-Nurnberg (Germany)
Norbert Streibl, Univ. Erlangen-Nuernberg (Germany)


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