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Optical Engineering

Ultraviolet stability and contamination analysis of Spectralon diffuse reflectance material
Author(s): Albert E. Stiegman; Carol J. Bruegge; Arthur W. Springsteen
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Paper Abstract

A detailed chemical analysis was carried out on Spectralon, a highly Lambertian, diffuse reflectance material. Results of this investigation unambiguously identified the presence of an organic (hydrocarbon) impurity intrinsic to the commercial material. This impurity could be removed by a vacuum bake-out procedure and was identified as the cause of optical changes (degradation) that occur in the material when exposed to UV light. It was found that when this impurity was removed, the Spectralon material was photochemically stable and maintained its reflectance properties even after extensive solar UV exposure.

Paper Details

Date Published: 1 April 1993
PDF: 6 pages
Opt. Eng. 32(4) doi: 10.1117/12.132374
Published in: Optical Engineering Volume 32, Issue 4
Show Author Affiliations
Albert E. Stiegman, Jet Propulsion Lab. (United States)
Carol J. Bruegge, Jet Propulsion Lab. (United States)
Arthur W. Springsteen, Labsphere, Inc. (United States)

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