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Optical Engineering • new

Study on Brewster angle thin film polarizer using hafnia–silica mixture as high-refractive-index material
Author(s): Nuo Xu; Meiping Zhu; Jian Sun; Yingjie Chai; Kui Yi; Yuanan Zhao; Jianda Shao
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Paper Abstract

Two kinds of polarizer coatings were prepared by electron beam evaporation, using HfO2–SiO2 mixture and HfO2 as the high-refractive-index materials, respectively. The HfO2–SiO2 mixture layer was implemented by coevaporating SiO2 and metal Hf, the materials were deposited at an oxygen atmosphere to achieve stoichiometric coatings. The certain HfO2 and SiO 2 content ratio is controlled by adjusting the deposition rate of HfO2 and SiO2 using individual quartz crystal monitor. The spectral performance, surface and interfacial properties, as well as the laser-induced damage performance were studied and compared. Comparing with polarizer coating using HfO2 as high-refractive-index material, the polarizer coating using HfO2–SiO2 mixture as high-refractive-index material shows better performance with broader polarizing bandwidth, lower surface roughness, better interfacial property while maintaining high laser-induced damage threshold.

Paper Details

Date Published: 9 February 2018
PDF: 4 pages
Opt. Eng. 57(2) 025101 doi: 10.1117/1.OE.57.2.025101
Published in: Optical Engineering Volume 57, Issue 2
Show Author Affiliations
Nuo Xu, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Chinese Academy of Sciences (China)
Meiping Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Jian Sun, Shanghai Institute of Optics and Fine Mechanics (China)
Yingjie Chai, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Kui Yi, Shanghai Institute of Optics and Fine Mechanics (China)
Yuanan Zhao, Shanghai Institute of Optics and Fine Mechanics (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics (China)


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