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Optical Engineering

Performance limits of binary annular phase masks codesigned for depth-of-field extension
Author(s): Rafael Falcón; François Goudail; Caroline Kulcsár; Hervé Sauer
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Paper Abstract

We investigate the performance limits of hybrid imaging systems including annular binary phase masks optimized for depth-of-field (DoF) extension, as a function of the number of rings and the desired DoF range. The mask parameters are optimized taking into account deconvolution of the acquired raw image in the expression of the global performance of the imaging system. We prove that masks with a limited number of rings are sufficient to obtain near-optimal performance. Moreover, the best achievable image quality decreases as the required DoF range increases, so that for a given required image quality, the DoF extension reachable with binary phase masks is bounded. Finally, these conclusions are shown to be robust against different optical system aberrations and models of scene power spectral density. These results are important in practice to decide if annular binary phase masks are the relevant solution for a given imaging problem and for mask manufacturing, since the number and thickness of the rings reachable at affordable cost by technology are generally limited.

Paper Details

Date Published: 29 June 2017
PDF: 12 pages
Opt. Eng. 56(6) 065104 doi: 10.1117/1.OE.56.6.065104
Published in: Optical Engineering Volume 56, Issue 6
Show Author Affiliations
Rafael Falcón, Institut d'Optique Graduate School (France)
François Goudail, Institut d'Optique Graduate School (France)
Caroline Kulcsár, Institut d'Optique Graduate School (France)
Hervé Sauer, Institut d'Optique Graduate School (France)

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