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Optical Engineering

Retardation of sol–gel titanium oxide with imprinted grating structure
Author(s): Itsunari Yamada; Yoshiro Ishihara; Tsuyoshi Akiyama
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Paper Abstract

We fabricated a titanium oxide grating using an imprinting technique and a sol–gel method and evaluated phase retardation. A titanium oxide grating with 75 nm depth, fill factor of 0.3, and 400 nm period was obtained by imprinting a titanium oxide sol solution on a silicone (polydimethylsiloxane; PDMS) mold at 150°C. As a result of phase retardation evaluation, it reached 9.2 deg at the 532-nm wavelength.

Paper Details

Date Published: 25 January 2017
PDF: 5 pages
Opt. Eng. 56(1) 017108 doi: 10.1117/1.OE.56.1.017108
Published in: Optical Engineering Volume 56, Issue 1
Show Author Affiliations
Itsunari Yamada, Univ. of Shiga Prefecture (Japan)
Yoshiro Ishihara, Univ. of Shiga Prefecture (Japan)
Tsuyoshi Akiyama, Univ. of Shiga Prefecture (Japan)

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