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Optical Engineering • Open Access

Double-meander spring silicon piezoresistive sensors as microforce calibration standards
Author(s): Gerry Hamdana; Hutomo Suryo Wasisto; Lutz Doering ; Chunlei Yan; Lei Zhou; Uwe Brand; Erwin Peiner

Paper Abstract

A transferable force calibration standard based on a silicon microelectromechanical sensor has been designed, fabricated, and characterized for micrometrology applications. Two essential elements of double-meander springs and full piezoresistive etched <inline-formula< <mml:math display="inline" xmlns:mml=""< <mml:mrow< <mml:mi<p</mml:mi< </mml:mrow< </mml:math< </inline-formula<-silicon-on-insulator Wheatstone bridges (WBs) are integrated to the sensor for enhancing the device’s sensitivity and eliminating the current leakage during an active sensing operation, respectively. The design process is supported by three-dimensional finite element modeling to select the optimal proposed sensors as well as simulating their mechanical and electrical properties in the desired force range (<inline-formula< <mml:math display="inline" xmlns:mml=""< <mml:mrow< <mml:mo form="prefix"<≤</mml:mo< <mml:mn<1000</mml:mn< <mml:mtext<  </mml:mtext< <mml:mi<μ</mml:mi< <mml:mi mathvariant="normal"<N</mml:mi< </mml:mrow< </mml:math< </inline-formula<). To fabricate the microforce sensors, a bulk micromachining technology is used by frequently involving an inductively coupled plasma deep reactive ion etching at cryogenic temperature. Several optical and electrical characterization techniques have been utilized to ensure the quality of the fabricated WBs, where their measured offset voltage can be down to <inline-formula< <mml:math display="inline" xmlns:mml=""< <mml:mrow< <mml:mn<0.03</mml:mn< <mml:mo<±</mml:mo< <mml:mn<0.071</mml:mn< <mml:mtext<  </mml:mtext< <mml:mi<mV</mml:mi< <mml:mo</</mml:mo< <mml:mi mathvariant="normal"<V</mml:mi< </mml:mrow< </mml:math< </inline-formula<. In terms of its linearity, the fabricated device exhibits a small nonlinearity of <inline-formula< <mml:math display="inline" xmlns:mml=""< <mml:mrow< <mml:mo form="prefix"<<</mml:mo< <mml:mn<3</mml:mn< <mml:mo<%</mml:mo< </mml:mrow< </mml:math< </inline-formula<, which leads this sensor to be appropriate for precise microforce standard.

Paper Details

Date Published: 27 May 2016
PDF: 12 pages
Opt. Eng. 55(9) 091409 doi: 10.1117/1.OE.55.9.091409
Published in: Optical Engineering Volume 55, Issue 9
Show Author Affiliations
Gerry Hamdana, Technische Univ. Braunschweig (Germany)
Lab. for Emerging Nanometrology (LENA) (Germany)
Hutomo Suryo Wasisto, Technische Univ. Braunschweig (Germany)
Lab. for Emerging Nanometrology (LENA) (Germany)
Lutz Doering , Physikalisch-Technische Bundesanstalt (Germany)
Chunlei Yan, Technische Univ. Braunschweig (Germany)
Lei Zhou, Technische Univ. Braunschweig (Germany)
Uwe Brand, Physikalisch-Technische Bundesanstalt (Germany)
Erwin Peiner, Technische Univ. Braunschweig (Germany)
Lab. for Emerging Nanometrology (LENA) (Germany)

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