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Optical Engineering

Point-specific self-calibration for improved characterization of thickness distribution
Author(s): Fangfang Meng; Kun Chen; Tian Zhou; Tao Wu; Haoyun Wei; Yan Li
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Paper Abstract

This work proposes a point-specific self-calibration method to characterize film thickness distribution by exploiting the multiple detection capability of a home-built full-field ellipsometer. The self-calibration method offers a feasible route for retrieving calibration information from the actual real-time sample measurement in conjunction with the ellipsometric parameters, thus leading to error-free data after the elimination of systematic errors and addressing the problem of high time-consumption. With the help of the multiple detection capability of a full-field ellipsometer, we can further implement self-calibration for every point-specific pixel, termed as point-specific self-calibration to achieve a high-accuracy film thickness profile. The synthetic thickness distribution composed of structural-anisotropy pixels with tilted surface is utilized to demonstrate the potential of the proposed approach by retrieving the ellipsometric angles and the calibration parameters of every single pixel. A three orders-of-magnitude improvement in the accuracy of thickness determination was achieved in the simulation. To demonstrate the feasibility of the proposed approach, a SiO2 film deposited on the Si substrate is measured in this work. This approach could be easily extended to implement thickness distribution measurements accurately and rapidly in other rotating-element ellipsometer cases.

Paper Details

Date Published: 5 August 2016
PDF: 8 pages
Opt. Eng. 55(8) 084102 doi: 10.1117/1.OE.55.8.084102
Published in: Optical Engineering Volume 55, Issue 8
Show Author Affiliations
Fangfang Meng, Tsinghua Univ. (China)
Kun Chen, Tsinghua Univ. (China)
Tian Zhou, Tsinghua Univ. (China)
Tao Wu, Tsinghua Univ. (China)
Haoyun Wei, Tsinghua Univ. (China)
Yan Li, Tsinghua Univ. (China)

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