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Optical Engineering

Automatic inspection of a residual resist layer by means of self-organizing map
Author(s): Zaki S. F. Philippe; Stéphane Robert; Bernard Bayard
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Paper Abstract

Photolithography allows large-scale fabrication of nanocomponents in the semiconductor industry. This technique consists of manufacturing a desired pattern on a photoresist film transferred onto the substrate during the etching process. Therefore, the mask quality is essential for reliable etching. For example, the presence of a residual layer of resist might be considered as a mask defect and can lead to the failure of the etching process. We propose the use of a Kohonen self-organizing map for automatic detection of a residual layer from an ellipsometric signature. The feasibility of the suggested inspection by the use of a classification technique is discussed and simulations are carried out on a 750-nm period grating.

Paper Details

Date Published: 26 May 2016
PDF: 5 pages
Opt. Eng. 55(5) 054106 doi: 10.1117/1.OE.55.5.054106
Published in: Optical Engineering Volume 55, Issue 5
Show Author Affiliations
Zaki S. F. Philippe, Lab. Hubert Curien (France)
Stéphane Robert, Lab. Hubert Curien (France)
Bernard Bayard, Lab. Hubert Curien (France)

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