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Optical Engineering

Simulating semiconductor structures for next-generation optical inspection technologies
Author(s): Ori Golani; Ido Dolev; James Pond; Jens Niegemann
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Paper Abstract

We present a technique for optimizing advanced optical imaging methods for nanoscale structures, such as those encountered in the inspection of cutting-edge semiconductor devices. The optimization flow is divided to two parts: simulating light-structure interaction using the finite-difference time-domain (FDTD) method and simulating the optical imaging system by means of its optical transfer function. As a case study, FDTD is used to simulate 10-nm silicon line-space and static random-access memory patterns, with irregular structural protrusions and silicon-oxide particles as defects of interest. An ultraviolet scanning-spot optical microscope is used to detect these defects, and the optimization flow is used to find the optimal imaging mode for detection.

Paper Details

Date Published: 2 February 2016
PDF: 7 pages
Opt. Eng. 55(2) 025102 doi: 10.1117/1.OE.55.2.025102
Published in: Optical Engineering Volume 55, Issue 2
Show Author Affiliations
Ori Golani, Applied Materials, Ltd. (Israel)
Ido Dolev, Applied Materials, Ltd. (Israel)
James Pond, Lumerical Solutions, Inc. (Canada)
Jens Niegemann, Lumerical Solutions, Inc. (Canada)


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