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Optical Engineering

Aberration measurements in speckle field by Shack–Hartmann wavefront sensor
Author(s): Andrey A. Goloborodko; Myhaylo M. Kotov; Vitaliy N. Kurashov; Dmytro V. Podanchuk
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Paper Abstract

The accuracy of the Shack–Hartmann wavefront sensor for measuring wavefront aberrations is mainly dependent upon the measuring accuracy of the centroid of each spot. An effect of the aperture of the 4F system on the correlation properties of speckle patterns produced with monochromatic light is investigated at the Shack–Hartmann sensor plane and at the focal plane of the sensor. An expression for a speckle patterns correlation length changing due to the extended aperture of the 4F system is derived by Fourier optics method. The experimental results that confirm the theoretical dependence quality within the limits of errors are obtained, and it is shown that the spatial finiteness of the optical system causes significant changes of transferred aberrated field.

Paper Details

Date Published: 6 July 2016
PDF: 6 pages
Opt. Eng. 55(12) 121710 doi: 10.1117/1.OE.55.12.121710
Published in: Optical Engineering Volume 55, Issue 12
Show Author Affiliations
Andrey A. Goloborodko, National Taras Shevchenko Univ. of Kyiv (Ukraine)
Myhaylo M. Kotov, National Taras Shevchenko Univ. of Kyiv (Ukraine)
Vitaliy N. Kurashov, National Taras Shevchenko Univ. of Kyiv (Ukraine)
Dmytro V. Podanchuk, National Taras Shevchenko Univ. of Kyiv (Ukraine)

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