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Optical Engineering

Calibrating the pupil fill balance for hypernumerical aperture lithographic objective
Author(s): Dawei Rui; Wei Zhang; Huaijiang Yang
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Paper Abstract

Projection objectives for deep-ultraviolet lithography typically have a dual-telecentric design, and the telecentricity in object space (mask) is idealized as zero. However, for combined illumination and objective lens systems, telecentricity matching on mask can result in a dramatic change in the pupil intensity distribution. Here, we propose a method of identifying the impact of the mismatch on the pupil fill and decoupling the pupil intensity balance from the telecentricity modulation. The technique is implemented in a user-defined program, and a series of simulations for a hypernumerical aperture immersion objective under off-axis illumination conditions verifies the method.

Paper Details

Date Published: 21 September 2015
PDF: 6 pages
Opt. Eng. 54(9) 095103 doi: 10.1117/1.OE.54.9.095103
Published in: Optical Engineering Volume 54, Issue 9
Show Author Affiliations
Dawei Rui, Changchun Institute of Optics, Fine Mechanics and Physics (China)
State Key Lab. of Applied Optics (China)
Wei Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Huaijiang Yang, Changchun Institute of Optics, Fine Mechanics and Physics (China)


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