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Optical Engineering

Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrological applications
Author(s): Zdenko Zápražný; Dušan Korytár; Matej Jergel; Peter Šiffalovič; Edmund Dobročka; Patrik Vagovič; Claudio Ferrari; Petr Mikulík; Maksym Demydenko; Marek Mikloška
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Paper Abstract

We present the numerical optimization and the technological development progress of x-ray optics based on asymmetric germanium crystals. We show the results of several basic calculations of diffraction properties of germanium x-ray crystal monochromators and of an analyzer-based imaging method for various asymmetry factors using an x-ray energy range from 8 to 20 keV. The important parameter of highly asymmetric monochromators as image magnifiers or compressors is the crystal surface quality. We have applied several crystal surface finishing methods, including advanced nanomachining using single-point diamond turning (SPDT), conventional mechanical lapping, chemical polishing, and chemomechanical polishing, and we have evaluated these methods by means of atomic force microscopy, diffractometry, reciprocal space mapping, and others. Our goal is to exclude the chemical etching methods as the final processing technique because it causes surface undulations. The aim is to implement very precise deterministic methods with a control of surface roughness down to 0.1 nm. The smallest roughness (∼0.3  nm), best planarity, and absence of the subsurface damage were observed for the sample which was machined using an SPDT with a feed rate of 1  mm/min and was consequently polished using a fine polishing 15-min process with a solution containing SiO2 nanoparticles (20 nm).

Paper Details

Date Published: 2 March 2015
PDF: 12 pages
Opt. Eng. 54(3) 035101 doi: 10.1117/1.OE.54.3.035101
Published in: Optical Engineering Volume 54, Issue 3
Show Author Affiliations
Zdenko Zápražný, Slovak Academy of Sciences (Slovakia)
Dušan Korytár, Slovak Academy of Sciences (Slovakia)
Matej Jergel, Slovak Academy of Sciences (Slovakia)
Peter Šiffalovič, Slovak Academy of Sciences (Slovakia)
Edmund Dobročka, Slovak Academy of Sciences (Slovakia)
Patrik Vagovič, Deutsches Elektronen-Synchrotron (Germany)
Claudio Ferrari, Consiglio Nazionale delle Ricerche (Italy)
Petr Mikulík, Masaryk Univ. (Czech Republic)
Maksym Demydenko, Slovak Academy of Sciences (Slovakia)
Sumy State Univ. (Ukraine)
Marek Mikloška, Integra TDS (Slovakia)

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