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Optical Engineering

Fabrication of multilevel resist patterns by using a liquid crystal mask
Author(s): Piotr Slupski; Michal P. Nikodem; Liming Chai; Katarzyna Komorowska
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Paper Abstract

Photolithographic processes of multilevel features in microfluidics can be complex and expensive. This paper demonstrates a quick method for manufacturing multilevel patterns, which is based on liquid crystal display masking during a standard lithography process for master mold fabrication for the polydimethysiloxane replica process. An active mask, based on a liquid crystal display, can simplify the process due to the ability to quickly modify designs and reduce the overhead for alignment between mask levels. The possibility of multilevel patterning, with the help of active masking, creates new opportunities for optical lithography processes. We have developed the process for a standard, mercury lamp exposure mask aligner system. The patterning characteristics were evaluated with a step pattern fabricated as an example of three-dimensional patterning for multilevel structuring. The application of a liquid crystal mask for resist contrast measurements was demonstrated.

Paper Details

Date Published: 16 November 2015
PDF: 6 pages
Opt. Eng. 54(11) 115107 doi: 10.1117/1.OE.54.11.115107
Published in: Optical Engineering Volume 54, Issue 11
Show Author Affiliations
Piotr Slupski, Wroclaw Research Ctr. EIT+ (Poland)
Michal P. Nikodem, Wroclaw Research Ctr. EIT+ (Poland)
Liming Chai, SUSS MicroTec Lithography GmbH (Germany)
Katarzyna Komorowska, Wroclaw Research Ctr. EIT+ (Poland)

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