Share Email Print
cover

Optical Engineering

Central aperture detection for auto direct read-write photoresist fabrication and inspection
Author(s): Justin M. Sierchio; Melissa Zaverton; Lee Johnson; Victor Densmore; Thomas Milster
Format Member Price Non-Member Price
PDF $20.00 $25.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We show the design for a laser scanning microscopy defect detection system based upon the idea that the light can reflect off a photoresist-laden fused-silica sample containing defects, allowing height and depth information to be obtained through changes in light intensity. Image registration using predefined points is employed. Image processing techniques involving median and deconvolution filtering are used. Results show that the 2.1-μm resolution of these defects is obtainable, and receiver operating characteristic curves are used for quantifying results. Discriminabilities of 0.73 are achieved. Preliminary results for larger-array patterns through stitching processes are also shown.

Paper Details

Date Published: 6 August 2014
PDF: 7 pages
Opt. Eng. 53(8) 084104 doi: 10.1117/1.OE.53.8.084104
Published in: Optical Engineering Volume 53, Issue 8
Show Author Affiliations
Justin M. Sierchio, College of Optical Sciences, The Univ. of Arizona (United States)
Melissa Zaverton, College of Optical Sciences, The Univ. of Arizona (United States)
Lee Johnson, College of Optical Sciences, The Univ. of Arizona (United States)
Victor Densmore, College of Optical Sciences, The Univ. of Arizona (United States)
Thomas Milster, College of Optical Sciences, The Univ. of Arizona (United States)


© SPIE. Terms of Use
Back to Top