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Optical Engineering

Superhydrophobic dual micro- and nanostructures fabricated by direct laser interference lithography
Author(s): Wenjun Li; Zuobin Wang; Dapeng Wang; Ziang Zhang; Le Zhao; Dayou Li; Renxi Qiu; Carsten R. Maple
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Paper Abstract

A method for the fabrication of highly ordered superhydrophobic dual micro- and nanostructures on silicon by direct laser interference lithography (LIL) is presented. The method offers its innovation that the superhydrophobic dual micro- and nanostructures can be fabricated directly by controlling the process of four-beam laser interference and the use of hydrofluoric acid (HF) to wipe off the silica generated during the process. Different laser fluences, exposure durations, and cleanout times have been investigated to obtain the optimum value of the contact angle (CA). The superhydrophobic surface with the CA of 153.2 deg was achieved after exposure of 60 s and immersion in HF with a concentration of 5% for 3 min. Compared with other approaches, it is a facile and efficient method with its significant feature for the macroscale fabrication of highly ordered superhydrophobic dual micro- and nanostructures on silicon.

Paper Details

Date Published: 27 March 2014
PDF: 7 pages
Opt. Eng. 53(3) 034109 doi: 10.1117/1.OE.53.3.034109
Published in: Optical Engineering Volume 53, Issue 3
Show Author Affiliations
Wenjun Li, Changchun Univ. of Science and Technology (China)
Zuobin Wang, Changchun Univ. of Science and Technology (China)
Dapeng Wang, Changchun Univ. of Science and Technology (China)
Ziang Zhang, Changchun Univ. of Science and Technology (China)
Le Zhao, Changchun Univ. of Science and Technology (China)
Dayou Li, Univ. of Bedfordshire (United Kingdom)
Renxi Qiu, Univ. of Bedfordshire (United Kingdom)
Carsten R. Maple, Univ. of Bedfordshire (United Kingdom)


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