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Optical Engineering

Effect of etching on the laser-induced damage properties of artificial defects under 1064-nm laser irradiation
Author(s): Menglei Lu; Bin Ma; Guangda Zhan; Hongfei Jiao; Xinbin Cheng
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Paper Abstract

The cracks and scratches inevitably generated by previous grinding and polishing significantly lower the ability of laser resistance of optical substrates. In this study, the artificial indentations, scratches, and structural defects imbedded with metal nanoparticles are fabricated. The laser-induced damage characteristics of such defects in different types and sizes are investigated qualitatively and quantitatively under 1064-nm laser irradiation. Moreover, the etching effect on improving the laser-induced damage threshold (LIDT) of artificial defects under different etching conditions is analyzed. LIDT is then evaluated according to the etching depth and the morphologies of artificial defects.

Paper Details

Date Published: 1 July 2014
PDF: 7 pages
Opt. Eng. 53(12) 122505 doi: 10.1117/1.OE.53.12.122505
Published in: Optical Engineering Volume 53, Issue 12
Show Author Affiliations
Menglei Lu, Tongji Univ. (China)
Bin Ma, Tongji Univ. (China)
Guangda Zhan, Tongji Univ. (China)
Hongfei Jiao, Tongji Univ. (China)
Xinbin Cheng, Tongji Univ. (China)

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