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Optical Engineering

Effect of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers
Author(s): Yuriy P. Pershyn; Eric M. Gullikson; Valeriy V. Kondratenko; Valentine V. Mamon; Svetlana A. Reutskaya; Dmitriy L. Voronov; Evgeniy N. Zubarev; Igor A. Artyukov; Alexander V. Vinogradov
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Paper Abstract

By methods of cross-sectional transmission electron microscopy and small-angle x-ray scattering (λ=0.154  nm ) the influence of Ar gas pressure (1 to 4 mTorr) on the growth of amorphous interfaces in Mo/Si multilayers (MLs) deposited by DC magnetron sputtering is studied. The significant reduction in the ML period, which is evident as a volumetric contraction, is observed in MLs deposited at Ar pressure where the mean-free path for the sputtered atoms is comparable with the magnetron-substrate distance. Some reduction in the thickness of the amorphous interlayers with Ar pressure increase is found, where the composition of the interlayers is enriched with molybdenum. The interface modification resulted in an increase in EUV reflectance of the Mo/Si MLs.

Paper Details

Date Published: 20 September 2013
PDF: 11 pages
Opt. Eng. 52(9) 095104 doi: 10.1117/1.OE.52.9.095104
Published in: Optical Engineering Volume 52, Issue 9
Show Author Affiliations
Yuriy P. Pershyn, Kharkiv Polytechnical Institute (Ukraine)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
Valeriy V. Kondratenko, Kharkiv Polytechnical Institute (Ukraine)
Valentine V. Mamon, Kharkiv Polytechnical Institute (Ukraine)
Svetlana A. Reutskaya, Kharkiv Polytechnical Institute (Ukraine)
Dmitriy L. Voronov, Lawrence Berkeley National Lab. (United States)
Evgeniy N. Zubarev, Kharkiv Polytechnical Institute (Ukraine)
Igor A. Artyukov, P.N. Lebedev Physical Institute (Russian Federation)
Alexander V. Vinogradov, P.N. Lebedev Physical Institute (Russian Federation)


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