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Optical Engineering

Fabrication of large-scale photonic phased array using a holographic lithography system
Author(s): Shen Shaoxin; Xuechang Ren; Shou Liu; Zhilin Yang; Yuanying Zhang
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Paper Abstract

A holographic lithography method for fabricating large-scale photonic phased array is presented. The large-scale array could be generated using a specially designed holographic optical element and the period could be decreased by half with the help of a half-wave plate. This method provides a convenient way to obtain the photonic array with a smaller period without shortening the recording wavelength. <sc<matlab</sc< simulations and primary experimental results have demonstrated that the phase modulation and nonlinear photoresist response played collectively significant roles in tuning the distribution of the array. The large-scale photonic phased array with a smaller period is an ideal candidate as a Raman substrate.

Paper Details

Date Published: 9 September 2013
PDF: 7 pages
Opt. Eng. 52(9) 095103 doi: 10.1117/1.OE.52.9.095103
Published in: Optical Engineering Volume 52, Issue 9
Show Author Affiliations
Shen Shaoxin, Xiamen Univ. (China)
Xuechang Ren, Xiamen Univ. (China)
Shou Liu, Xiamen Univ. (China)
Zhilin Yang, Xiamen Univ. (China)
Yuanying Zhang, Xiamen Univ. (China)


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