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Optical Engineering

Subwavelength interference lithography based on a unidirectional surface plasmon coupler
Author(s): Xuefeng Yang; Shuxia Zhang; Dao Hua Zhang; Yueke Wang; Jian Wang
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Paper Abstract

A subwavelength interference lithography method is numerically demonstrated based on surface plasmon polaritons excited by unidirectional couplers, and the unidirectional coupler is composed of a conventional nanoslit with a nanochannel excavated from one side of this nanoslit. Simulation results show that a feature size of 50 nm half-pitch pattern can be obtained at the working wavelength of 365 nm, and this method can enhance the intensity of the interference pattern with higher contrast and field depth and is advantageous to the fabrication process in practical applications.

Paper Details

Date Published: 8 August 2013
PDF: 4 pages
Opt. Eng. 52(8) 086109 doi: 10.1117/1.OE.52.8.086109
Published in: Optical Engineering Volume 52, Issue 8
Show Author Affiliations
Xuefeng Yang, Henan Polytechnic Univ. (China)
Shuxia Zhang, Henan Polytechnic Univ. (China)
Dao Hua Zhang, Nanyang Technological Univ. (Singapore)
Yueke Wang, Nanyang Technological Univ. (Singapore)
Jian Wang, Henan Polytechnic Univ. (China)


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