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Optical Engineering • Open Access

Ultraviolet laser writing system based on polar scanning strategy to produce subwavelength metal gratings for surface plasmon resonance
Author(s): Jun Amako; Eiichi Fujii

Paper Abstract

We demonstrate the use of ultraviolet (UV) laser lithography in the production of subwavelength metal gratings. A laser writing system with a 413-nm Kr laser is used to write patterns on a resist-coated fused silica substrate mounted on a rotating table with a linear slider. One- and two-dimensional patterns are written in the resist at a selected sampling pitch or grating period, and the substrate is dry etched and coated with Au to obtain metallized gratings. Surface plasmon resonance dips, which appear in the reflectance spectra of the gratings, shift depending on the orientation of the incident polarization, because the gratings lack perfect symmetry owing to a system-induced skew in the writing beam. This dip shift can be considered tolerable when the gratings are used as a signal enhancer in Raman sensing applications. We conclude that UV laser writing based on polar coordinates is a candidate method for surface structuring on submicron scales. Devising a method to attain an unskewed beam will be the subject of future work.

Paper Details

Date Published: 4 June 2013
PDF: 7 pages
Opt. Eng. 52(6) 063403 doi: 10.1117/1.OE.52.6.063403
Published in: Optical Engineering Volume 52, Issue 6
Show Author Affiliations
Jun Amako, Toyo Univ. (Japan)
Eiichi Fujii, Seiko Epson Corp. (Japan)

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