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Optical Engineering

High-order aberration measurement technique based on a quadratic Zernike model with optimized source
Author(s): Jishuo Yang; Xiangzhao Wang; Sikun Li; Lifeng Duan; Guanyong Yan; Dongbo Xu; Anatoly Y. Bourov; Andreas Erdmann
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Paper Abstract

In this paper, we propose an aberration metrology (AM) of a lithographic projection lens based on aerial images (AI) by using a quadratic relationship model (Quad) between the aerial-image intensity distribution and the Zernike coefficients. The proposed method (AMAI-Quad) uses principal component analysis and multiple linear regression analyses for model generation. The quadratic model is, then, used to extract Zernike coefficients by a nonlinear least-squares minimizing technique. The best linear constrain condition is estimated by optimizing the illumination settings. Compared with earlier techniques, based on a linear relationship between Zernike coefficients and AIs, the new method can extend the orders of Zernike coefficients measured. The application of AMAI-Quad to AIs, computed by lithography simulators PROLITH and Dr.LiTHO, demonstrated an extension of measurement range to 90mλ and an enhancement of measurement accuracy by more than 30 percent.

Paper Details

Date Published: 7 May 2013
PDF: 14 pages
Opt. Eng. 52(5) 053603 doi: 10.1117/1.OE.52.5.053603
Published in: Optical Engineering Volume 52, Issue 5
Show Author Affiliations
Jishuo Yang, Shanghai Institute of Optics and Fine Mechanics (China)
Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Sikun Li, Shanghai Institute of Optics and Fine Mechanics (China)
Lifeng Duan, Shanghai Micro Electronics Equipment Co., Ltd. (China)
Guanyong Yan, Shanghai Institute of Optics and Fine Mechanics (China)
Dongbo Xu, Shanghai Institute of Optics and Fine Mechanics (China)
Anatoly Y. Bourov, Shanghai Micro Electronics Equipment Co., Ltd. (China)
Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)


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