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Optical Engineering • Open Access

Implementation of uniform diffraction efficiency of partially overlapping holograms in photopolymers based on the photopolymerization of a free radical
Author(s): Wei Song; Shiquan Tao; Qianli Zhai; Dayong Wang

Paper Abstract

The exposure schedule model for uniform diffraction efficiency is extended to be suitable for the partially overlapping multiplexing method. The proposed model is based on solving an optimization problem. Fifty holograms were multiplexed using the exposure schedule calculated with the extended model. The material used in the experiment is based on the photopolymerization of a free radical. By comparing the intensity of the reconstructed images during recording with that readout after recording, the calculated exposure schedule is verified to be effective to realize the uniform diffraction efficiency for the multiplexing holographic storage.

Paper Details

Date Published: 16 April 2013
PDF: 9 pages
Opt. Eng. 52(4) 045801 doi: 10.1117/1.OE.52.4.045801
Published in: Optical Engineering Volume 52, Issue 4
Show Author Affiliations
Wei Song, Beijing Univ. of Technology (China)
Shiquan Tao, Beijing Univ. of Technology (China)
Qianli Zhai, Beijing Univ. of Technology (China)
Dayong Wang, Beijing Univ. of Technology (China)

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