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Optical Engineering

Fabrication of x-ray diffractive optical elements for laser fusion applications
Author(s): Changqing Xie; Xiaoli Zhu; Hailiang Li; Jiebin Niu; Yilei Hua; Lina Shi
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Paper Abstract

We review our recent progress on the fabrication of x-ray diffractive optical elements (DOEs) by combining complementary advantages of electron beam, x-ray, and proximity optical lithography. First, an electron beam lithography tool with an accelerating voltage of 100 kV is used to expose initial x-ray mask based on SiC membrane with a low aspect ratio. Second, x-ray lithography is used to replicate x-ray DOEs and amplify the aspect ratio up to 14:1. Third, proximity optical lithography is used to fabricate a large-scale gold mesh as the supporting structures. We demonstrate that this method can achieve high aspect ratio metal nanometer structures without the need of a complicated multilayer resist process. A large number of x-ray DOEs have been fabricated with feature sizes down to 100 nm for the purpose of laser plasma fusion applications. Among them, the ninth-order diffraction peak on the positive side of the zeroth order can be observed for both 3333 and 5000  lines/mm x-ray gold transmission gratings.

Paper Details

Date Published: 5 March 2013
PDF: 9 pages
Opt. Eng. 52(3) 033402 doi: 10.1117/1.OE.52.3.033402
Published in: Optical Engineering Volume 52, Issue 3
Show Author Affiliations
Changqing Xie, Institute of Microelectronics (China)
Xiaoli Zhu, Institute of Microelectronics (China)
Hailiang Li, Institute of Microelectronics (China)
Jiebin Niu, Institute of Microelectronics (China)
Yilei Hua, Institute of Microelectronics (China)
Lina Shi, Institute of Microelectronics (China)

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