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Optical Engineering • Open Access

Errata: Analysis of characteristic parameters of a plasma ion source and of ion-assisted deposited optical thin films
Author(s): Omer Faruk Farsakglu

Paper Abstract

This article [Opt. Eng.. 44, , 103601 (2005)] was originally published on 4 October 2005 with three references missing from the reference list.

Paper Details

Date Published: 14 September 2012
PDF: 1 pages
Opt. Eng. 51(9) 099801 doi: 10.1117/1.OE.51.9.099801
Published in: Optical Engineering Volume 51, Issue 9
Show Author Affiliations
Omer Faruk Farsakglu, Turkish Land Forces Logistics Command (Turkey)

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