Share Email Print

Optical Engineering • Open Access

Fabrication of porous silicon-based silicon-on-insulator photonic crystal by electrochemical etching method
Author(s): Furu Zhong; Xiao-yi Lv; Zhen-hong Jia; Jiaqing Mo

Paper Abstract

We present a fast, novel method for building porous silicon-based silicon-on-insulator photonic crystals in which a periodic modulation of the refractive index is built by alternating different electrochemical etching currents. The morphology and reflectance spectra of the photonic crystals, prepared by the proposed method, are investigated. The scanning electron micrograph and atomic force microscopy images show a very uniform structure and the porous silicon demonstrates an 829 nm wide photonic band gap.

Paper Details

Date Published: 18 April 2012
PDF: 4 pages
Opt. Eng. 51(4) 040502 doi: 10.1117/1.OE.51.4.040502
Published in: Optical Engineering Volume 51, Issue 4
Show Author Affiliations
Furu Zhong, Xinjiang Univ. (China)
Xiao-yi Lv, Xinjiang Univ. (China)
Zhen-hong Jia, Xinjiang Univ. (China)
Jiaqing Mo, Xinjiang Univ. (China)

© SPIE. Terms of Use
Back to Top