Share Email Print

Optical Engineering

Tunable surface plasmons interference patterns with the same mask in nanolithography
Author(s): Xia Wan; Qingkang Wang; Haihua Tao
Format Member Price Non-Member Price
PDF $20.00 $25.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

When a transverse magnetic-polarized beam illuminates normally on an Ag grating mask with sub-wavelength slits, the surface plasmon (SP) interference patterns are formed on the Ag surface. According to the dispersion relationship of SPs, the wavelength of SPs (λsp) is tunable by altering the refractive index of the photoresist or the illumination wavelength. Various λsp form interference patterns with different size. The interference patterns are tunable using the same mask with period microns in size, which can save the cost of fabricating a different mask. This method will have potential applications to nanolithography.

Paper Details

Date Published: 29 February 2012
PDF: 5 pages
Opt. Eng. 51(2) 028001 doi: 10.1117/1.OE.51.2.028001
Published in: Optical Engineering Volume 51, Issue 2
Show Author Affiliations
Xia Wan, Shanghai Jiao Tong Univ. (China)
Qingkang Wang, Shanghai Jiao Tong Univ. (China)
Haihua Tao, Shanghai Jiao Tong Univ. (China)

© SPIE. Terms of Use
Back to Top