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Optical Engineering

Characterization of photoresist and simulation of a developed resist profile for the fabrication of gray-scale diffractive optic elements
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Paper Abstract

We have characterized a photoresist used for the fabrication of gray-scale diffractive optic elements in terms of Dill's and Mack's model parameters. The resist model parameters were employed for the simulations of developed resist profiles for sawtooth patterns executed by solving the Eikonal equation with the fast-marching method. The simulated results were shown to be in good agreement with empirical data.

Paper Details

Date Published: 23 February 2012
PDF: 8 pages
Opt. Eng. 51(2) 023401 doi: 10.1117/1.OE.51.2.023401
Published in: Optical Engineering Volume 51, Issue 2
Show Author Affiliations
Jong Rak Park, Chosun Univ. (Korea, Republic of)
Justin M. Sierchio, College of Optical Sciences, The Univ. of Arizona (United States)
Melissa A. Zaverton, College of Optical Sciences, The Univ. of Arizona (United States)
Youngsik Kim, College of Optical Sciences, The Univ. of Arizona (United States)
Thomas D. Milster, College of Optical Sciences, The Univ. of Arizona (United States)


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