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Optical Engineering

Alignment method based on matched dual-grating moiré fringe for proximity lithography
Author(s): Jiangping Zhu; Song Hu; Jungsheng Yu; Yan Tang
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Paper Abstract

The application of dual-grating moiré fringe is introduced in lithography alignment. Minute angular displacement between the two alignment marks will lead to the tilt of moiré fringe, which has an influence in high-accuracy alignment. Proposed is a novel measurement method of angular displacement based on the phase of moiré fringe. The relationship between phase of moiré fringe and angular displacement is analyzed. Both simulation and experiment indicate that an angular displacement can be determined to achieve a linear displacement measurement with error of nanometer level.

Paper Details

Date Published: 1 November 2012
PDF: 9 pages
Opt. Eng. 51(11) 113603 doi: 10.1117/1.OE.51.11.113603
Published in: Optical Engineering Volume 51, Issue 11
Show Author Affiliations
Jiangping Zhu, Institute of Optics and Electronics (China)
Song Hu, Institute of Optics and Electronics (China)
Jungsheng Yu, Univ. of Electronic Science and Technology of China (China)
Yan Tang, Institute of Optics and Electronics (China)

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