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Optical Engineering

Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
Author(s): Richard Fu; James Pattison
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Paper Abstract

Mercury cadmium telluride (HgCdTe) processing must be performed at a low temperature in order to reduce Hg depletion. To meet demand, low-temperature plasma enhanced atomic layer deposition (PE-ALD) is an emerging deposition technology for highly conformal thin films. We comparatively studied the effectiveness of low-temperature PE-ALD by measuring the ALD film roughness, thickness, and dielectric values. Conformal deposition was investigated through scanning electron microscopy images of the Al 2 O 3 film deposited onto high aspect ratio features dry-etched into HgCdTe. PE-ALD demonstrated conformal coatings of trenches, pillars and holes in advanced HgCdTe infrared sensor architectures.

Paper Details

Date Published: 3 October 2012
PDF: 4 pages
Opt. Eng. 51(10) 104003 doi: 10.1117/1.OE.51.10.104003
Published in: Optical Engineering Volume 51, Issue 10
Show Author Affiliations
Richard Fu, U.S. Army Research Lab. (United States)
James Pattison, U.S. Army Research Lab. (United States)

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